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Show all We have the following products.See below:
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High density ceramic sputtering target
(CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
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High purity alloy sputtering target
High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Allo
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ITO target, AZO target,IGZO target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3,Ni2O3, Cr2O3, ZnO, ZnS, CdS
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Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In target
High pure metal sputtering target:Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn,
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Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag
High pure metal sputtering target:Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn,
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ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3
ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. other compounds vacuum coating materials.For complex film,
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ITO target, AZO target,IGZO target, MgO, Y2O3 target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3,Ni2O3, Cr2O3, ZnO, ZnS, CdS
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Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target
High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy
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